For quality control purposes, wafers, such as semiconductor or flat-panel display (FPD) chips, need to be examined under a microscope to verify that they meet specifications related to both circuit ...

The alpha300 Semiconductor Edition is a sophisticated confocal Raman microscope designed for the chemical analysis of semiconducting materials. This advanced tool helps researchers quickly analyze ...

Semiconductor circuits (patterns) printed on semiconductor wafers (substrates) are shrinking, while such substrates are becoming larger in physical size. Over the years, the inspection of patterned ...

PORTLAND, Ore. — FEI Co. (Hillsboro, Ore.) will unveil a family of transmission electron microscopes (TEM) next week that it says will enable atomic-scale imaging and analysis of semiconductor wafers.

To use electron or ion beams to create nano-patterns the three methods that are typically used include ion beam milling, beam induced chemistry (deposition and etch), and beam induced lithography.

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

Outfitted with an automated front-opening universal-pod loader, the Helios NanoLab 1200AT from FEI can be located inside the semiconductor wafer fab, where its SEM (scanning electron microscope) ...

This is part of a NASA-supported project hoping to fabricate "device-ready" wafers from space-grown crystals. When you purchase through links on our site, we may earn an affiliate commission. Here’s ...

A paper in Science Advances (12 August) provides proof of a new concept, using new solid 3D superlenses to break through the scale of things previously visible through a microscope. Illustrating the ...