The growing demand for heterogeneous integration is driven by the 5G market. This includes smartphones, data centers, servers, high-performance computing (HPC), artificial intelligence (AI) and ...
Advanced Semiconductor Device Lithography – what is going to happen next ? The noise and hype level around lithography these days is rather loud. At SPIE’s Advanced Lithography conference this year, a ...
To help chipmakers conquer the time-to-market yield challenges of 45nm chip manufacturing, including the ones associated with immersion lithography, KLA-Tencor Inc. is launching a new overlay ...
Building an integrated circuit (IC) requires various physical and chemical processes to be performed on a semiconductor (e.g., silicon) substrate. Millions of transistors can be fabricated and wired ...
Sematech and the Semiconductor Metrology Systems (SMS) division of Carl Zeiss claim to have reached a key development milestone in the development of a next generation photomask registration and ...
VELDHOVEN, Netherlands--(BUSINESS WIRE)--ASML Holding NV (ASML) today announced three new extensions for its popular TWINSCAN NXT platform that improve imaging, overlay and productivity. The ...
As semiconductor technology advanced from 65nm to 7nm over the last 10 years, new challenges have arisen in design and manufacturing. Securing the IC yield means developing new methods that respond to ...
Veldhoven, the Netherlands. ASML has announced the first shipment of its new TWINSCAN NXT:1980Di immersion lithography system to support increasingly demanding multiple-patterning performance ...
(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...
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