SANTA CLARA, Calif.--(BUSINESS WIRE)--Anchor Semiconductor Inc. today introduced an easy-to-adopt Optical Proximity Correction (OPC) acceleration tool that will significantly shorten OPC cycle time ...
The computing demands of modern applications, especially those making heavy use of AI, are extending pressure beyond design ...
As semiconductor technology advanced from 65nm to 7nm over the last 10 years, new challenges have arisen in design and manufacturing. Securing the IC yield means developing new methods that respond to ...
Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...
Photomasks are becoming more complex at each node. In fact, masks are moving from traditional shapes to non-orthogonal patterns and complex shapes, such as curvilinear mask patterns. To measure ...
The eBeam Initiative, which has been tightly focused on eliminating the need for photomasks at critical layers in today’s leading-edge processes, today announced an additional project: making ...
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