These models can be used either offline to provide the optimal process cycle, or online to provide optimal, real-time process control [3]. This is the target of the iREMO project (www.iremo.eu), an EC ...
Effective fabrication of complex, high performance semiconductor devices is highly dependent on the use of chemical mechanical planarization (CMP). This process is used to planarize the wafer surface ...
Results that may be inaccessible to you are currently showing.
Hide inaccessible results
Feedback